Atomic Layer Deposition of Platinum on Strontium Titanate Surfaces
نویسندگان
چکیده
Atomic Layer Deposition of Platinum on Strontium Titanate Surfaces Tremendous energy savings and environmental benefits are possible from improved catalysts for chemical manufacturing and emissions reduction. Breakthroughs in catalyst development will be enabled by precise methods for synthesizing nanostructured materials. Atomic layer deposition (ALD) is a thin film growth technique that is currently used by the microelectronics industry and offers great potential for synthesizing better catalysts. In this seminar I will present recent results from work at Argonne synthesizing, characterizing, and testing materials comprised of ALD platinum on strontium titanate surfaces as potential catalysts for reducing automotive emissions. We employ a variety of analytical techniques including scanningand transmission-electron microscopy, and synchrotron X-Ray scattering methods to understand the structure and composition of the platinum catalysts and also to explore the ALD growth behavior. Surprisingly, the ALD Pt consists of nearly monodispersed nanoparticles that decorate the strontium titanate and are highly active for hydrocarbon combustion.
منابع مشابه
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................................................................................................................... 3 Acknowledgements....................................................................................................... 5 List of Figures........................................................................................................... 10 List of Tables....................
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